Atomic-layer deposited thulium oxide as a passivation layer on germanium



Mitrovic, IZ, Hall, S, Althobaiti, M, Hesp, D, Dhanak, VR, Santoni, A, Weerakkody, AD, Sedghi, N, Chalker, PR, Henkel, C
et al (show 5 more authors) (2015) Atomic-layer deposited thulium oxide as a passivation layer on germanium. JOURNAL OF APPLIED PHYSICS, 117 (21). ISSN 0021-8979

WarningThere is a more recent version of this item available.
[img] Text
JAP-Mitrovic et al-2015.pdf

Download (1MB)
Item Type: Article
Subjects: Q Science > Q Science (General)
Q Science > QC Physics
Depositing User: Symplectic Admin
Date Deposited: 04 Jun 2015 09:01
Last Modified: 28 Apr 2016 13:30
DOI: 10.1063/1.4922121
URI: http://livrepository.liverpool.ac.uk/id/eprint/2012840

Available Versions of this Item

Repository Staff Access