Novel high-k dielectrics for MOS applications



Taechakumput, Pouvanart
(2008) Novel high-k dielectrics for MOS applications. PhD thesis, University of Liverpool.

[img] Text
490807.pdf

Download (5MB) | Preview
Item Type: Thesis (PhD)
Uncontrolled Keywords: Engineering, Electrical and electronics
Depositing User: Repository Admin
Date Deposited: 11 Dec 2019 16:37
Last Modified: 11 Dec 2019 16:39
DOI: 10.17638/03065952
Copyright Statement: Copyright © and Moral Rights for this thesis and any accompanying data (where applicable) are retained by the author and/or other copyright owners. A copy can be downloaded for personal non-commercial research or study, without prior permission or charge.
URI: http://livrepository.liverpool.ac.uk/id/eprint/3065952
Repository Staff Access