High-k dielectrics for CMOS application



Lu, Yi
(2006) High-k dielectrics for CMOS application. PhD thesis, University of Liverpool.

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Item Type: Thesis (PhD)
Uncontrolled Keywords: Engineering, Electrical and electronics
Depositing User: Symplectic Admin
Date Deposited: 20 Jan 2023 11:45
Last Modified: 20 Jan 2023 12:31
DOI: 10.17638/03167603
Copyright Statement: Copyright © and Moral Rights for this thesis and any accompanying data (where applicable) are retained by the author and/or other copyright owners. A copy can be downloaded for personal non-commercial research or study, without prior permission or charge.
Digitisation Notes : Unnumbered page before page i. Duplicate pages 130-140 not counted.
URI: https://livrepository.liverpool.ac.uk/id/eprint/3167603