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Xie, Xinkai, Fang, Yuxiao, Lu, Cheng, Tao, Yi, Yin, Li, Zhang, Yibo, Wang, Zixin, Wang, Shiyan, Zhao, Jianwen, Tu, Xin 
ORCID: 0000-0002-6376-0897 et al (show 5 more authors)
(2023)
Effective interfacial energy band engineering strategy toward high-performance triboelectric nanogenerator.
Chemical Engineering Journal, 452.
p. 139469.
Fang, Yuxiao, Zhao, Chun, Mitrovic, Ivona Z ORCID: 0000-0003-4816-8905 and Zhao, Cezhou
(2021)
High-Performance and Radiation-Hardened Solution-Processed ZrLaO Gate Dielectrics for Large-Area Applications.
ACS APPLIED MATERIALS & INTERFACES, 13 (42).
pp. 50101-50110.
Fang, Yuxiao
(2021)
The Investigation of Fabrication and Reliability of Solution-Processed High-k Dielectrics.
PhD thesis, University of Liverpool.
Mu, Yifei, Fang, Yuxiao, Zhao, Ce Zhou, Zhao, Chun, Lu, Qifeng, Qi, Yanfei, Yi, Ruowei, Yang, Li, Mitrovic, Ivona Z ORCID: 0000-0003-4816-8905, Taylor, Stephen ORCID: 0000-0002-2144-8459 et al (show 1 more authors)
(2017)
Total Dose Effects and Bias Instabilities of (NH<sub>4</sub>)<sub>2</sub>S Passivated Ge MOS Capacitors With Hf<i><sub>x</sub></i>Zr<sub>1-<i>x</i></sub>O<i><sub>y</sub></i> Thin Films.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 64 (12).
pp. 2913-2921.
Fang, Yuxiao, Xu, Wangying, Zhao, Tianshi, Mitrovic, Ivona Z ORCID: 0000-0003-4816-8905, Yang, Li ORCID: 0000-0002-1040-4223, Zhao, Chun and Zhao, Cezhou
(2022)
A promising method to improve the bias-stress and biased-radiation-stress stabilities of solution-processed AlOx thin films.
Radiation Physics and Chemistry, 192.
p. 109899.