The effect of changing the magnetic field strength on HiPIMS deposition rates



Bradley, JW, Mishra, A and Kelly, PJ
(2015) The effect of changing the magnetic field strength on HiPIMS deposition rates. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 48 (21).

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Item Type: Article
Uncontrolled Keywords: magnetron sputtering, HiPIMS, deposition rates, magnetic field strengths, back attraction, flux model
Subjects: ?? QC ??
Depositing User: Symplectic Admin
Date Deposited: 14 Aug 2015 08:07
Last Modified: 12 Aug 2022 14:10
DOI: 10.1088/0022-3727/48/21/215202
Related URLs:
URI: https://livrepository.liverpool.ac.uk/id/eprint/2020387