Chalker, PR ORCID: 0000-0002-2295-6332
(2016)
Photochemical atomic layer deposition and etching.
SURFACE & COATINGS TECHNOLOGY, 291.
258 - 263.
Item Type: | Article |
---|---|
Uncontrolled Keywords: | Atomic layer deposition, ALD, Atomic layer etching, ALE, Photochemical, UV-assisted, Area selective deposition |
Depositing User: | Symplectic Admin |
Date Deposited: | 07 Jun 2016 07:55 |
Last Modified: | 10 Jan 2021 21:10 |
DOI: | 10.1016/j.surfcoat.2016.02.046 |
Open Access URL: | http://www.sciencedirect.com.liverpool.idm.oclc.or... |
Related URLs: | |
URI: | https://livrepository.liverpool.ac.uk/id/eprint/3001563 |
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