Photochemical atomic layer deposition and etching


Chalker, PR ORCID: 0000-0002-2295-6332 (2016) Photochemical atomic layer deposition and etching. SURFACE & COATINGS TECHNOLOGY, 291. 258 - 263.

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Item Type: Article
Uncontrolled Keywords: Atomic layer deposition, ALD, Atomic layer etching, ALE, Photochemical, UV-assisted, Area selective deposition
Depositing User: Symplectic Admin
Date Deposited: 07 Jun 2016 07:55
Last Modified: 16 Sep 2022 00:14
DOI: 10.1016/j.surfcoat.2016.02.046
Open Access URL: http://www.sciencedirect.com.liverpool.idm.oclc.or...
Related URLs:
URI: https://livrepository.liverpool.ac.uk/id/eprint/3001563
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