Photochemical atomic layer deposition and etching



Chalker, PR ORCID: 0000-0002-2295-6332
(2016) Photochemical atomic layer deposition and etching. SURFACE & COATINGS TECHNOLOGY, 291. 258 - 263.

Access the full-text of this item by clicking on the Open Access link.
Item Type: Article
Uncontrolled Keywords: Atomic layer deposition, ALD, Atomic layer etching, ALE, Photochemical, UV-assisted, Area selective deposition
Depositing User: Symplectic Admin
Date Deposited: 07 Jun 2016 07:55
Last Modified: 10 Jan 2021 21:10
DOI: 10.1016/j.surfcoat.2016.02.046
Open Access URL: http://www.sciencedirect.com.liverpool.idm.oclc.or...
Related URLs:
URI: https://livrepository.liverpool.ac.uk/id/eprint/3001563