Effects of Rapid Thermal Annealing on the Structural, Electrical, and Optical Properties of Zr-Doped ZnO Thin Films Grown by Atomic Layer Deposition



Wu, Jingjin, Zhao, Yinchao, Zhao, Ce Zhou, Yang, Li, Lu, Qifeng, Zhang, Qian, Smith, Jeremy ORCID: 0000-0002-0212-2365 and Zhao, Yongming
(2016) Effects of Rapid Thermal Annealing on the Structural, Electrical, and Optical Properties of Zr-Doped ZnO Thin Films Grown by Atomic Layer Deposition. MATERIALS, 9 (8).

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Item Type: Article
Uncontrolled Keywords: Zr-doped ZnO, atomic layer deposition, rapid thermal annealing, red-shift
Depositing User: Symplectic Admin
Date Deposited: 13 Sep 2016 15:00
Last Modified: 04 Sep 2022 08:19
DOI: 10.3390/ma9080695
Open Access URL: http://www.mdpi.com/1996-1944/9/8/695
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URI: https://livrepository.liverpool.ac.uk/id/eprint/3003284