Growth, Dielectrics Properties, and Reliability of High-k Thin Films Grown on Si and Ge Substrates



Lu, Q
(2017) Growth, Dielectrics Properties, and Reliability of High-k Thin Films Grown on Si and Ge Substrates. PhD thesis, University of Liverpool.

[img] Text
200945983_Jun2017.pdf

Download (2MB)
Item Type: Thesis (PhD)
Divisions: Fac of Science & Engineering > School of Electrical Engineering, Electronics and Computer Science
Depositing User: Symplectic Admin
Date Deposited: 13 Aug 2018 09:03
Last Modified: 09 Jan 2021 06:12
DOI: 10.17638/03013042
Supervisors:
URI: https://livrepository.liverpool.ac.uk/id/eprint/3013042