Growth, Dielectrics Properties, and Reliability of High-k Thin Films Grown on Si and Ge Substrates


Lu, Q (2017) Growth, Dielectrics Properties, and Reliability of High-k Thin Films Grown on Si and Ge Substrates. PhD thesis, University of Liverpool.

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Item Type: Thesis (PhD)
Divisions: Faculty of Science and Engineering > School of Electrical Engineering, Electronics and Computer Science
Depositing User: Symplectic Admin
Date Deposited: 13 Aug 2018 09:03
Last Modified: 19 Jan 2023 06:49
DOI: 10.17638/03013042
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URI: https://livrepository.liverpool.ac.uk/id/eprint/3013042
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