Growth, Dielectrics Properties, and Reliability of High-k Thin Films Grown on Si and Ge Substrates

Lu, Q (2017) Growth, Dielectrics Properties, and Reliability of High-k Thin Films Grown on Si and Ge Substrates PhD thesis, University of Liverpool.

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Item Type:	Thesis (PhD)
Divisions:	Faculty of Science & Engineering > School of Electrical Engineering, Electronics and Computer Science
Depositing User:	Symplectic Admin
Date Deposited:	13 Aug 2018 09:03
Last Modified:	19 Jan 2023 06:49
DOI:	10.17638/03013042
Supervisors:	Zhao, C Taylor, S ORCID: 0000-0002-2144-8459 Chalker, P ORCID: 0000-0002-2295-6332
URI:	https://livrepository.liverpool.ac.uk/id/eprint/3013042
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