Chai, Zheng, Zhang, Weidong, Freitas, Pedro, Hatem, Firas, Zhang, Jian Fu, Marsland, John, Govoreanu, Bogdan, Goux, Ludovic, Kar, Gouri Sankar, Hall, Steve
ORCID: 0000-0001-8387-1036 et al (show 2 more authors)
(2018)
The Over-Reset Phenomenon in Ta<sub>2</sub>O<sub>5</sub> RRAM Device Investigated by the RTN-Based Defect Probing Technique.
IEEE ELECTRON DEVICE LETTERS, 39 (7).
pp. 955-958.
ISSN 0741-3106, 1558-0563
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Text
EDL-2018-04-0624_Ta2O5_over-reset_final.pdf - Author Accepted Manuscript Download (557kB) |
Abstract
Despite the tremendous efforts in the past decade devoted to the development of filamentary resistive-switching devices (RRAM), there is still a lack of in-depth understanding of its over-reset phenomenon. At higher reset stop voltages that exceed a certain threshold, the resistance at high resistance state reduces, leading to an irrecoverable window reduction. The over-reset phenomenon limits the maximum resistance window that can be achieved by using a higher V<inf>reset</inf>, which also degrades its potential in applications such as multi-level memory and neuromorphic synapses. In this letter, the over-reset is investigated by cyclic reset operations with incremental stop voltages, and is explained by defect generation in the filament constriction region of Ta<inf>2</inf>O<inf>5</inf> RRAM devices. This is supported by the statistical spatial defects profile obtained from the random telegraph noise based defect probing technique. The impact of forming compliance current on the over-reset is also evaluated.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Resistive switching, RRAM, over-reset, defect profile, random telegraph noise, Ta2O5, HfO2 |
| Depositing User: | Symplectic Admin |
| Date Deposited: | 02 May 2018 15:20 |
| Last Modified: | 17 Jun 2025 07:01 |
| DOI: | 10.1109/LED.2018.2833149 |
| Related Websites: | |
| URI: | https://livrepository.liverpool.ac.uk/id/eprint/3020849 |
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