Atomic Layer Deposited TiO2/Al2O3 Nanolaminates on GaN

Jones, L, Das, Partha ORCID: 0000-0003-1147-6541, Manzanera, TP, Gibbon, JT ORCID: 0000-0003-1548-0791, Potter, Richard ORCID: 0000-0003-0896-4536, Chalker, Paul ORCID: 0000-0002-2295-6332, Mahapatra, Rajat, Dhanak, Vin and Mitrovic, Ivona Z ORCID: 0000-0003-4816-8905
(2019) Atomic Layer Deposited TiO2/Al2O3 Nanolaminates on GaN. In: Isulating Films on Semiconductors (INFOS) 2019, 2019-06-30 - 2019-07-03, Clare College, University of Cambridge.

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Item Type: Conference or Workshop Item (Unspecified)
Depositing User: Symplectic Admin
Date Deposited: 18 Mar 2019 11:31
Last Modified: 03 Mar 2021 09:23