Effect of HCl cleaning on InSb-Al2O3 MOS capacitors

Vavasour, Oliver J, Jefferies, Richard, Walker, Marc, Roberts, Joseph W, Meakin, Naomi R, Gammon, Peter M, Chalker, Paul R ORCID: 0000-0002-2295-6332 and Ashley, Tim
(2019) Effect of HCl cleaning on InSb-Al2O3 MOS capacitors. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 34 (3).

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Item Type: Article
Uncontrolled Keywords: InSb, III-V, HCl, ALD, Al2O3, MOSCAP
Depositing User: Symplectic Admin
Date Deposited: 25 Mar 2019 10:09
Last Modified: 01 Sep 2022 08:27
DOI: 10.1088/1361-6641/ab0331
Related URLs:
URI: https://livrepository.liverpool.ac.uk/id/eprint/3034855