Bias-stress stability and radiation response of solution-processed AlOx dielectrics investigated by on-site measurements



Fang, YX, Zhao, C, Mitrovic, IZ ORCID: 0000-0003-4816-8905, Hall, S ORCID: 0000-0001-8387-1036, Yang, L and Zhao, CZ
(2019) Bias-stress stability and radiation response of solution-processed AlOx dielectrics investigated by on-site measurements. .

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infos2019-abstract_Yuxiao_Final-postZHAO-v2.pdf - Accepted Version

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Item Type: Conference or Workshop Item (Unspecified)
Uncontrolled Keywords: Solution-processed, High-k gate dielectric, AlOx, Biased gamma-ray radiation stress stability
Depositing User: Symplectic Admin
Date Deposited: 25 Mar 2019 14:21
Last Modified: 05 Oct 2021 08:18
DOI: 10.1016/j.mee.2019.111113
Related URLs:
URI: https://livrepository.liverpool.ac.uk/id/eprint/3034880