Fang, YX, Zhao, C, Mitrovic, IZ ORCID: 0000-0003-4816-8905, Hall, S ORCID: 0000-0001-8387-1036, Yang, L and Zhao, CC
(2019)
Bias-stress stability and radiation response of solution-processed AlOx dielectrics investigated by on-site measurements.
Microelectronic Engineering.
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X Fang et al MEE Aug 2019.pdf - Author Accepted Manuscript Download (959kB) | Preview |
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Fang et al-MEE-accepted manuscript-22 Aug 2019.pdf - Author Accepted Manuscript Download (753kB) | Preview |
Item Type: | Article |
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Depositing User: | Symplectic Admin |
Date Deposited: | 27 Aug 2019 08:51 |
Last Modified: | 19 Jan 2023 00:28 |
DOI: | 10.1016/j.mee.2019.111113 |
URI: | https://livrepository.liverpool.ac.uk/id/eprint/3052421 |
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