Bias-stress stability and radiation response of solution-processed AlOx dielectrics investigated by on-site measurements



Fang, YX, Zhao, C, Mitrovic, IZ ORCID: 0000-0003-4816-8905, Hall, S ORCID: 0000-0001-8387-1036, Yang, L and Zhao, CC
(2019) Bias-stress stability and radiation response of solution-processed AlOx dielectrics investigated by on-site measurements. Microelectronic Engineering.

[img] Text
X Fang et al MEE Aug 2019.pdf - Accepted Version

Download (959kB) | Preview
[img] Text
Fang et al-MEE-accepted manuscript-22 Aug 2019.pdf - Accepted Version

Download (753kB) | Preview
Item Type: Article
Depositing User: Symplectic Admin
Date Deposited: 27 Aug 2019 08:51
Last Modified: 05 Oct 2021 08:18
DOI: 10.1016/j.mee.2019.111113
URI: https://livrepository.liverpool.ac.uk/id/eprint/3052421