High-k dielectric stacks for integration into an advanced CMOS process



Davey, William Mark
(2010) High-k dielectric stacks for integration into an advanced CMOS process. PhD thesis, University of Liverpool.

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Item Type: Thesis (PhD)
Uncontrolled Keywords: Engineering, Electrical and electronics
Depositing User: Symplectic Admin
Date Deposited: 21 Nov 2019 14:03
Last Modified: 21 Nov 2019 14:29
DOI: 10.17638/03062728
Copyright Statement: Copyright © and Moral Rights for this thesis and any accompanying data (where applicable) are retained by the author and/or other copyright owners. A copy can be downloaded for personal non-commercial research or study, without prior permission or charge.
Digitisation Notes : Image 60 - figure blurred on original hardcopy thesis.
URI: https://livrepository.liverpool.ac.uk/id/eprint/3062728