Novel high-k dielectrics for MOS applications

Taechakumput, Pouvanart
(2008) Novel high-k dielectrics for MOS applications. PhD thesis, University of Liverpool.

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Item Type: Thesis (PhD)
Uncontrolled Keywords: Engineering, Electrical and electronics
Depositing User: Repository Admin
Date Deposited: 11 Dec 2019 16:37
Last Modified: 11 Dec 2019 16:39
DOI: 10.17638/03065952
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