Das, Partha ORCID: 0000-0003-1147-6541, Jones, Leanne AH, Gibbon, James T, Dhanak, Vinod R, Partida-Manzanera, Teresa, Roberts, Joseph W, Potter, Richard
ORCID: 0000-0003-0896-4536, Chalker, Paul R
ORCID: 0000-0002-2295-6332, Cho, Sung-Jin, Thayne, Iain G et al (show 2 more authors)
(2020)
Band Line-up Investigation of Atomic Layer Deposited TiAlO and GaAlO on GaN.
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 9 (6).
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Das et al-ECS JSST- final accepted manuscript.docx - Accepted Version Download (2MB) |
Item Type: | Article |
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Uncontrolled Keywords: | GaN, Dielectrics, High-k, Atomic layer deposition, X-ray photoelectron spectroscopy, Band offsets, Kraut method, Metal insulator semiconductor capacitor |
Depositing User: | Symplectic Admin |
Date Deposited: | 23 Jul 2020 08:03 |
Last Modified: | 09 Jan 2021 01:48 |
DOI: | 10.1149/2162-8777/aba4f4 |
Related URLs: | |
URI: | https://livrepository.liverpool.ac.uk/id/eprint/3094937 |
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