Progress in atomic layer deposited α-Ga2O3materials and solar-blind detectors



Massabuau, FCP, Roberts, JW, Nicol, D, Edwards, PR, McLelland, M, Dallas, GL, Hunter, DA, Nicolson, EA, Jarman, JC, Kovacs, A
et al (show 3 more authors) (2021) Progress in atomic layer deposited α-Ga2O3materials and solar-blind detectors In: Oxide-based Materials and Devices XII, 2021-3-6 - 2021-3-12.

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Abstract

Atomic layer deposition (ALD) offers a low thermal budget method for producing α-Ga<inf>2</inf>O<inf>3</inf>films on sapphire substrate. In this paper we review the recent progress on plasma-enhanced ALD growth of α-Ga<inf>2</inf>O<inf>3</inf>and present the optical and photoconductive properties of the deposited films. We show that the deposited material exhibits an epitaxial relationship with the sapphire substrate, and with an atomically sharp film-substrate interface. The α-Ga<inf>2</inf>O<inf>3</inf>films had an optical bandgap energy measured at 5.11 eV, and exhibited a broad luminescence spectrum dominated by ultraviolet, blue and green bands, in line with current literature. We finally demonstrate the suitability of the material for solar-blind photodetection.

Item Type: Conference Item (Unspecified)
Uncontrolled Keywords: 40 Engineering, 4016 Materials Engineering, 51 Physical Sciences
Divisions: Faculty of Science & Engineering > School of Engineering
Depositing User: Symplectic Admin
Date Deposited: 25 Jun 2021 08:43
Last Modified: 21 Jan 2026 20:55
DOI: 10.1117/12.2588729
Related Websites:
URI: https://livrepository.liverpool.ac.uk/id/eprint/3127667
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