Structure of the interface in sub-nm EOT TmSiO/HfO2 gate stack



Mitrovic, IZ ORCID: 0000-0003-4816-8905, Supardan, SN, Hesp, D, Dhanak, VR, Hall, S ORCID: 0000-0001-8387-1036, Schamm-Chardon, S, Dentoni Litta, E, Hellstrom, P-E and Ostling, M
(2016) Structure of the interface in sub-nm EOT TmSiO/HfO2 gate stack. In: 19th Workshop on Dielectrics in Microelectronics –WODIM 2016, 2016-6-27 - 2016-6-30, Catania, Italy.

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Item Type: Conference or Workshop Item (Unspecified)
Depositing User: Symplectic Admin
Date Deposited: 30 Jun 2016 15:13
Last Modified: 19 Jan 2023 07:35
URI: https://livrepository.liverpool.ac.uk/id/eprint/3001882