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Fang, YX, Zhao, C, Mitrovic, IZ 
ORCID: 0000-0003-4816-8905, Hall, S ORCID: 0000-0001-8387-1036, Yang, L and Zhao, CZ
(2019)
Bias-stress stability and radiation response of solution-processed AlOx dielectrics investigated by on-site measurements.
In: Insulating Films on Semiconductors, INFOS 2019, 2019-6-30 - 2019-7-3, Clare College, University of Cambridge, UK.
Fang, YX, Zhao, C, Mitrovic, IZ ORCID: 0000-0003-4816-8905, Hall, S ORCID: 0000-0001-8387-1036, Yang, L and Zhao, CC
(2019)
Bias-stress stability and radiation response of solution-processed AlOx dielectrics investigated by on-site measurements.
Microelectronic Engineering.
Fang, YX, Xu, WY, Mitrovic, IZ ORCID: 0000-0003-4816-8905, Yang, L, Zhao, C and Zhao, CZ
(2021)
An environmentally friendly solution-processed ZrLaO gate dielectric for large-area applications in the harsh radiation environment.
In: 2021 International Conference on IC Design and Technology (ICICDT), 2021-9-15 - 2021-9-17.