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Number of items: 2.
Chalker, PR 
ORCID: 0000-0002-2295-6332, Marshall, PA, Dawson, K ORCID: 0000-0003-3249-8328, Brunell, IF, Sutcliffe, CJ and Potter, RJ ORCID: 0000-0003-0896-4536
(2015)
Vacuum ultraviolet photochemical selectivearea atomic layer deposition of Al2O3 dielectrics.
AIP Advances, 5 (1).
017115-017115.
Golrokhi, Z, Marshall, PA, Romani, S, Rushworth, S, Chalker, PR ORCID: 0000-0002-2295-6332 and Potter, RJ ORCID: 0000-0003-0896-4536
(2017)
The influence of tertiary butyl hydrazine as a co-reactant on the atomic layer deposition of silver.
Applied Surface Science, 399.
pp. 123-131.