Barrier tuning of atomic layer deposited Ta2O5 and Al2O3 in double dielectric diodes

Noureddine, IN, Sedghi, N, Mitrovic, IZ and Hall, S (2017) Barrier tuning of atomic layer deposited Ta2O5 and Al2O3 in double dielectric diodes. Journal of Vacuum Science and Technology B. ISSN 2166-2754

Text INN et al JVST B Nov 2016x.pdf - Author Accepted Manuscript Download (1MB)

Item Type:	Article
Depositing User:	Symplectic Admin
Date Deposited:	17 Nov 2016 08:04
Last Modified:	19 Jan 2023 07:25
URI:	https://livrepository.liverpool.ac.uk/id/eprint/3004513

Available Versions of this Item

• Barrier tuning of atomic layer deposited Ta2O5 and Al2O3 in double dielectric diodes. (deposited 17 Nov 2016 08:04) [Currently Displayed]
  • Barrier tuning of atomic layer deposited Ta2O5 and Al2O3 in double dielectric diodes. (deposited 01 Feb 2017 15:09)