Conduction mechanisms in Al-Ta<sub>2</sub>O<sub>5</sub>-Al<sub>2</sub>O<sub>3</sub>-Al rectifiers



Weerakkody, AD, Sedghi, N ORCID: 0000-0002-2004-6159, Zhan, X, Mitrovic, IZ ORCID: 0000-0003-4816-8905 and Hall, S ORCID: 0000-0001-8387-1036
(2015) Conduction mechanisms in Al-Ta<sub>2</sub>O<sub>5</sub>-Al<sub>2</sub>O<sub>3</sub>-Al rectifiers. In: 2015 11th Conference on Ph.D. Research in Microelectronics and Electronics (PRIME), 2015-6-29 - 2015-7-2, University of Glasgow.

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Abstract

This paper investigates the dominant conduction mechanisms in two bi-layer Ta2O5-Al2O3 structures fabricated by atomic layer deposition and rf sputtering. In depth experimental (electrical and optical) and theoretical analysis have been conducted to demonstrate the dominancy of quantum mechanical tunnelling, a desirable conduction mechanism for high-speed nanorectifier device operation.

Item Type: Conference or Workshop Item (Unspecified)
Uncontrolled Keywords: Metal-insulator-insulator-metal, conduction mechanisms, Schottky emission, Direct tunnelling, Fowler-Nordheim tunnelling, Spectroscopic ellipsometry
Depositing User: Symplectic Admin
Date Deposited: 15 Feb 2017 11:07
Last Modified: 18 Oct 2023 04:27
DOI: 10.1109/prime.2015.7251352
Related URLs:
URI: https://livrepository.liverpool.ac.uk/id/eprint/3005786