Particle-balance models for pulsed sputtering magnetrons

Huo, Chunqing, Lundin, D, Gudmundsson, JT, Raadu, MA, Bradley, JW and Brenning, N (2017) Particle-balance models for pulsed sputtering magnetrons. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 50 (35). p. 354003.

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Abstract

The time-dependent plasma discharge ionization region model (IRM) has been under continuous development during the past decade and used in several studies of the ionization region of high-power impulse magnetron sputtering (HiPIMS) discharges. In the present work, a complete description of the most recent version of the IRM is given, which includes improvements, such as allowing for returning of the working gas atoms from the target, a separate treatment of hot secondary electrons, addition of doubly charged metal ions, etc. To show the general applicability of the IRM, two different HiPIMS discharges are investigated. The first set concerns 400 μs long discharge pulses applied to an Al target in an Ar atmosphere at 1.8 Pa. The second set focuses on 100 μs long discharge pulses applied to a Ti target in an Ar atmosphere at 0.54 Pa, and explores the effects of varying the magnetic field strength. The model results show that -ions contribute negligibly to the production of secondary electrons, while -ions effectively contribute to the production of secondary electrons. Similarly, the model results show that for an argon discharge with Al target the contribution of Al+-ions to the discharge current at the target surface is over 90% at 800 V. However, at 400 V the Al+-ions and Ar+-ions contribute roughly equally to the discharge current in the initial peak, while in the plateau region Ar+-ions contribute to roughly of the current. For high currents the discharge with Al target develops almost pure self-sputter recycling, while the discharge with Ti target exhibits close to a 50/50 combination of self-sputter recycling and working gas-recycling. For a Ti target, a self-sputter yield significantly below unity makes working gas-recycling necessary at high currents. For the discharge with Ti target, a decrease in the B-field strength, resulted in a corresponding stepwise increase in the discharge resistivity.

Item Type:	Article
Uncontrolled Keywords:	magnetron sputtering, HiPIMS, magnetron sputtering discharge, global model, secondary electron emission
Depositing User:	Symplectic Admin
Date Deposited:	29 Aug 2017 10:00
Last Modified:	19 Jan 2023 06:56
DOI:	10.1088/1361-6463/aa7d35
Related URLs:	Author Publisher
URI:	https://livrepository.liverpool.ac.uk/id/eprint/3009199